[ Research Areas ]

   ■ Nanoimprinting

   ■ Confocal Microscopy

   ■ Nano Functional Surfaces

   ■ Ultra Fast Maskless Nanolithography

   ■ Nano-Bio Sensors     




[ Research Capabilities ]


   ■   Optical Design Technology


   ■   Micro/Nano Master
          Fabrication Technology
E-beam Lithography
Holographic Lithography


   ■   Micro/Nano Mold
          Fabrication Technology
Metallic Mold Fabrication


   ■  Micro/Nano Molding          Technology
Nano-imprinting Process
Nano Releasing Technology
UV molding Process
Roll Imprinting


A. Nanoimprinting Lithography

Imprint Lithography is technique of transferring the image of nanostructures into a resist layer using pressure or UV light. This technology is proposed to fabricate extremely small pattern

▣ Advantages
    - No diffraction limit: Features as small as a few nanometers can been       fabricated.


    - Broad range of materials can be used, including polymers, metals, and
 No need for a specialized fabrication facility or clean room.

▣ Procedure
   1. Imprint step
- Nano mold with nano-scale pattern is pressed into a resist

2. Pattern transfer step
Pattern transfer to substrate by RIE (Reactive Ion Etching)
RIE is used to remove the residual resist in the compressed area