[ Research Areas ]

   ■ Nanoimprinting

   ■ Confocal Microscopy

   ■ Nano Functional Surfaces

   ■ Ultra Fast Maskless Nanolithography

   ■ Nano-Bio Sensors     

 

 

 

[ Research Capabilities ]

 

   ■   Optical Design Technology

     

   ■   Micro/Nano Master
          Fabrication Technology
        -
E-beam Lithography
        -
Holographic Lithography
        -
Photolithogrphy

    

   ■   Micro/Nano Mold
          Fabrication Technology
        -
Metallic Mold Fabrication

 

   ■  Micro/Nano Molding          Technology
        -
Nano-imprinting Process
        -
Nano Releasing Technology
        -
UV molding Process
        -
Roll Imprinting


 

A. Nanoimprinting Lithography


Imprint Lithography is technique of transferring the image of nanostructures into a resist layer using pressure or UV light. This technology is proposed to fabricate extremely small pattern


▣ Advantages
    - No diffraction limit: Features as small as a few nanometers can been       fabricated.

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    - Broad range of materials can be used, including polymers, metals, and
      ceramics.
 No need for a specialized fabrication facility or clean room.

▣ Procedure
   1. Imprint step
    
- Nano mold with nano-scale pattern is pressed into a resist

    
2. Pattern transfer step
    
Pattern transfer to substrate by RIE (Reactive Ion Etching)
     
RIE is used to remove the residual resist in the compressed area