[ Research Areas ]

   ■ Nanoimprinting

   ■ Confocal Microscopy

   ■ Nano Functional Surfaces

   ■ Ultra Fast Maskless Nanolithography

   ■ Nano-Bio Sensors     

 

 

 

[ Research Capabilities ]

 

   ■   Optical Design Technology

     

   ■   Micro/Nano Master
          Fabrication Technology
        -
E-beam Lithography
        -
Holographic Lithography
        -
Photolithogrphy

    

   ■   Micro/Nano Mold
          Fabrication Technology
        -
Metallic Mold Fabrication

 

   ■  Micro/Nano Molding          Technology
        -
Nano-imprinting Process
        -
Nano Releasing Technology
        -
UV molding Process
        -
Roll Imprinting


 
B. Holographic Lithography

Maskless patterning process using interference of lasers

▣ Advantages
    - Possible to fabricate one or two dimensional systematic patterns over
       large area
    - Possible to fabricate patterns over large area by once or twice
       exposure process without mask



▣ Procedure
    - Preparation of substrate -> Pre-baking -> HMDS coating -> PR
       coating -> soft-baking -> Holographic Lithography -> Developing
      -> Rinsing


▣ Fabricated nano patterns


<Line width 600 nm, pitch 1㎛, height 400 nm>



<Line width 200 nm, pitch 1㎛, height 400 nm>



<Line width 150 nm, pitch 500 nm, height 50 nm>



<Pitch 260 nm, dot diameter 50 nm (double exposure)>