∷ Optical Design Technology
    ∷ Micro/Nano Master
        Fabrication Technology
       A. E-beam Lithography
        B. Holographic Lithography
       C. Photolithogrphy
       
    ∷ Micro/Nano Mold
        Fabrication Technology
       A. Metallic Mold Fabrication
           - Electroforming Process
    ∷ Micro/Nano Molding        Technology
      A. Nano-imprinting Process
      B. Nano Releasing Technology
      C. UV molding Process(I)
          - Process
      D. Continuous UV-nano           Imprinting Technology

 

 


    

 

 
A. E-beam Lithography


Maskless direct writing process using E-beam with several nano-meters diameter

▣ Advantages
    - Possible to fabricate free shape nano scale pattern by e-beam writing
    - Direct writing process : possible to write patterns without mask

▣ Procedure
    - Preparation of substrate -> pre-baking -> HMDS spin coating ->
      PMMA spin coating  -> soft-baking -> e-beam exposure(direct writing)
      -> developing -> rinsing -> hard-baking



▣ Fabricated nano master
    - Case 1: Various diameter, pitch 200 nm (SEM image)


    - Case 2: Various diameter and pitch, height 100 nm (SEM image)


    - Case 3 : diameter 40nm and pitch 80nm (SEM image)

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