[ Research Areas ]

   ■ Nanoimprinting

   ■ Confocal Microscopy

   ■ Nano Functional Surfaces

   ■ Ultra Fast Maskless Nanolithography

   ■ Nano-Bio Sensors     

 

 

 

[ Research Capabilities ]

 

   ■   Optical Design Technology

     

   ■   Micro/Nano Master
          Fabrication Technology
        -
E-beam Lithography
        -
Holographic Lithography
        -
Photolithogrphy

    

   ■   Micro/Nano Mold
          Fabrication Technology
        -
Metallic Mold Fabrication

 

   ■  Micro/Nano Molding          Technology
        -
Nano-imprinting Process
        -
Nano Releasing Technology
        -
UV molding Process
        -
Roll Imprinting


 
A. E-beam Lithography


Maskless direct writing process using E-beam with several nano-meters diameter

▣ Advantages
    - Possible to fabricate free shape nano scale pattern by e-beam writing
    - Direct writing process : possible to write patterns without mask

▣ Procedure
    - Preparation of substrate -> pre-baking -> HMDS spin coating ->
      PMMA spin coating  -> soft-baking -> e-beam exposure(direct writing)
      -> developing -> rinsing -> hard-baking



▣ Fabricated nano master
    - Case 1: Various diameter, pitch 200 nm (SEM image)


    - Case 2: Various diameter and pitch, height 100 nm (SEM image)


    - Case 3 : diameter 40nm and pitch 80nm (SEM image)

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